Glow-Discharge Hydrogenated Amorphous Silicon
| AUTHOR | Tanaka, K. |
| PUBLISHER | Springer (11/30/1989) |
| PRODUCT TYPE | Hardcover (Hardcover) |
Description
A graduate-level description of recent Japanese research on the chemistry of amorphous silicon film deposition associated with plasma CVD, a step in producing amorphous semiconductors. Reports on studies (of microscopic processes of gas-phase reaction as well as chemical reactions on the film growin
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Product Format
Product Details
ISBN-13:
9780792303091
ISBN-10:
0792303091
Binding:
Hardback or Cased Book (Sewn)
Content Language:
English
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Page Count:
277
Carton Quantity:
28
Product Dimensions:
6.14 x 0.69 x 9.21 inches
Weight:
1.29 pound(s)
Country of Origin:
US
Subject Information
BISAC Categories
Technology & Engineering | Electronics - Circuits - General
Technology & Engineering | Materials Science - General
Technology & Engineering | Power Resources - Alternative & Renewable
Dewey Decimal:
621.381
Library of Congress Control Number:
89-34244
Descriptions, Reviews, Etc.
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A graduate-level description of recent Japanese research on the chemistry of amorphous silicon film deposition associated with plasma CVD, a step in producing amorphous semiconductors. Reports on studies (of microscopic processes of gas-phase reaction as well as chemical reactions on the film growin
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List Price $329.00
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$325.71